%0 Journal Article %A Kannaa, S. P. Neethish %A Srinivas, Jaladanki %A Yaswanth, Rage %A Venkatesan, Muniyandi %D 2019 %I Begell House %K two-phase flow, diode LASER, photoresistor, liquid film thickness, slug velocity %N 4 %P 345-358 %R 10.1615/MultScienTechn.2020031252 %T CHARACTERIZATION OF TWO-PHASE FLOW REGIMES USING LASER-PHOTORESISTOR TRANSCEIVER SETUPS %U https://www.dl.begellhouse.com/journals/5af8c23d50e0a883,66a03c6711c437b6,2998f36b2c906da0.html %V 31 %X Two-phase flow is the flow of two fluids of the same or different substances. Various flow regimes such as bubble, slug/plug, annular, and stratified flows are observed in mini/microtubes. Such flows occur in chemical processing, microelectronic cooling systems, microthrusters of nanosatellites, nuclear reactors, compact heat exchangers, and small-sized refrigeration systems. Estimation of liquid film thickness and void fraction in multiphase flow is still challenging. In the present work, a technique is developed to measure the liquid film thickness by using a LASER-photoresistor combination. An experimental setup is fabricated to measure liquid film thickness in a bubble regime. Two-phase flow is created using a Y channel mixer in a glass tube of 2.6 mm inner diameter with a thickness of 2.4 mm. Two red LASERs of wavelength 650 nm are used along with two photoresistors. The current (mA) output of the photoresistor during two-phase flow is recorded with an NI-cDAQ 9174 chassis with an NI 9203 current measuring module. A high-speed camera (PROMON 501) with Navitar zoom 7000 lens setup is used to capture the photographs of the two-phase regimes across the test section. The LASER-photoresistors are placed across the channel in two different orientations of horizontal and vertical position. Average liquid film thickness is measured with a validated numerical model created using COMSOL multiphysics. %8 2020-01-07