Выходит 12 номеров в год
ISSN Печать: 1044-5110
ISSN Онлайн: 1936-2684
Indexed in
THIN-FILM FORMATION BY USING FLASH-BOILING SPRAY
Краткое описание
A method for controlling evaporation by using chemical vapor deposition (CVD) with a mixed solution is proposed. In this method, called "flashing spray CVD", a mixed solution is transported through an injector at the top of the vacuum CVD chamber. The solution is evaporated by flashing when the chamber pressure is below the saturated vapor pressure of the solution, leading to formation of a lean, homogeneous vapor. This homogeneous vapor is then reacted with oxygen to form a film. In this paper, tetraethoxysilane (TEOS) was used as the precursor, and n-pentane was used as the low-boiling-point organic solvent because of its improvement of TEOS vaporization characteristics. The slit nozzle injector for the ambient condition was selected on the basis of spray shape revealed by optical measurements. Homogeneous SiO2 films on 300 mm diameter wafers could be formed by flashing spray CVD, and a slit nozzle that can be used to make films on wafers larger than 300 mm was produced. The best slit angle was determined from the results of magnification photography; LIF-Mie scattering was used in double-slit nozzles with various slit-to-slit angles, and the spray shapes obtained with those nozzles were compared using backlight photography. The best slit angle was found to be 180 degand the best slit-to-slit angle was found to be 120 deg.
-
OSHIMA Motohiro, YONEDA Anna, ASAKAWA Noto, MATSUMURA Eriko, SENDA Jiro, ISHIDA Kozo, Proposal of flame synthesis method for nanoparticles using flash boiling spray (TiO<sub>2</sub> particle characteristics influenced by injection condition and equivalence ratio), Transactions of the JSME (in Japanese), 82, 840, 2016. Crossref
-
Xiao Di, Yukihiko Ichikawa, Li Xuesong, Hung David, Nishida Keiya, Xu Min, Film breakup of tilted impinging spray under various pressure conditions, International Journal of Engine Research, 21, 2, 2020. Crossref