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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
Том 23, 2019 Том 22, 2018 Том 21, 2017 Том 20, 2016 Том 19, 2015 Том 18, 2014 Том 17, 2013 Том 16, 2012 Том 15, 2011 Том 14, 2010 Том 13, 2009 Том 12, 2008 Том 11, 2007 Том 10, 2006 Том 9, 2005 Том 8, 2004 Том 7, 2003 Том 6, 2002 Том 5, 2001 Том 4, 2000 Том 3, 1999 Том 2, 1998 Том 1, 1997

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Купить выпуск $144.00 Том 6, 2002 Выпуск 1

DOI: 10.1615/HighTempMatProc.v6.i1

Содержание:

Studies of pulsed ion- and electron-beams emitted from plasma discharges
Marek Sadowski, Jaroslaw Zebrowski
14 pages
DOI: 10.1615/HighTempMatProc.v6.i1.10
ELECTRON ENERGY DISTRIBUTION FUNCTION IN PLASMA ARC JETS
V. Lago, A. Lebehot, Michel A. Dudeck, Z. Szymanski
8 pages
DOI: 10.1615/HighTempMatProc.v6.i1.20
X-RAY AND CORPUSCULAR EMISSION FROM DIFFERENT PLASMA DISCHARGES OF AXIAL SYMMETRY
Elzbieta Skladnik-Sadowska, Jaroslaw Baranowski, Marek Sadowski, Jaroslaw Zebrowski
12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.30
STRUCTURAL STUDIES ON SEMICONDUCTING HYDROGENATED AMORPHOUS SILICON OXIDE FILMS
S. M. Iftiquar
19 pages
DOI: 10.1615/HighTempMatProc.v6.i1.40
Modelling of plasma dynamics in coaxial IPD accelerator
Marek Rabinski, Krzysztof Zdunek
7 pages
DOI: 10.1615/HighTempMatProc.v6.i1.50
THIN FILMS OF SILICON COMPOUNDS DEPOSITED BY PE-CVD AT ATMOSPHERIC PRESSURE
Krzysztof Schmidt-Szalowski, Z. Rzanek-Boroch, J. Sentek, Z. Rymuza, Z. Kusznierewicz, M. Misiak
12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.60
PROPERTIES OF SOME GLASS-CERAMICS IN MOLTEN AND SOLID STATE
12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.70
INVESTIGATION OF INTERACTION OF OXYGEN WITH HALIDE MELT
4 pages
DOI: 10.1615/HighTempMatProc.v6.i1.80
TRANSPORT REACTIONS IN SALT MELTS AND THEIR APPLIED ASPECTS
8 pages
DOI: 10.1615/HighTempMatProc.v6.i1.100