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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v1.i4.50
pages 461-472

COMPARISON OF AIR AND ARGON PLASMAS IN GASEOUS ELEMENTAL POLLUTANT ANALYSIS FOR PROCESS CONTROL AND ENVIRONMENT

Anne-Marie Gomes
Centre de Physique des Plasmas & de leurs Applications de Toulouse, ESA 5002 du CNRS, Universite Paul Sabatier, 118 route de Narbonne, 31062 Toulouse cedex4, France
C. Trassy
UPR 9033 CNRS - EPM, ENSHMG BP 95 - 38402 Saint-Martin-d'Heres - France
A. Almi
Centre de physique des plasmas et des applications - ESA 5002 Universite Paul Sabatier -31062 Toulouse Cedex - France
F. Seddiki
Laboratoire de physico-chimie industrielle - INS A - 69621 Villeurbanne Cedex - France
S. Hassaine
Laboratoire de physico-chimie industrielle, bat 401, INSA, F-69621 Villeurbanne, France

Краткое описание

Two types of inductively coupled plasma with optical spectroscopic detection (ICP-OES), using air and argon as a plasma gas, have been compared for on-line monitoring of elemental pollutants in gases. The performance, advantages and disadvantages of these two systems are discussed. In the air plasma system, the gas to be analysed is used directly as the plasma gas; in the case of the argon plasma system, the gas to be monitored is injected at a low flow rate (0.5 l/min) into the plasma. These two methods can be used in stack gas control as well as in workshop air control. Limits of detection are in the range 1 to 10 μg/m−3 (1 to 10 ppb). The response time, for both techniques, is lower than one minute.


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