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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v6.i3.30
6 pages

DETERMINATION OF SiO MOLECULE CONCENTRATION IN A DISCHARGE BY COMPARING SELF-ABSORBED AND ABSORBED EXPERIMENTAL SPECTRA WITH SIMULATED ONE

O. Motret
GREMI, UMR 6606, Universite d'Orleans, B.P. 6759, 45067 Orleans Cedex 2, France
F. Coursimault
GREMI, UMR 6606, Universite d'Orleans, B.P. 6759, 45067 Orleans Cedex 2, France
R. Viladrosa
GREMI, UMR 6606, Universite d'Orleans, B.P. 6759, 45067 Orleans Cedex 2, France
Jean-Michel Pouvesle
GREMI UMR 7344 CNRS/Université d'Orléans, Orléans, France

Краткое описание

In this study we have estimated the concentration of SiO molecules produced by atmospheric dielectric barrier discharges (DBD) by means of spectroscopic investigations. Two methods were developed based on absorption and self-absorption techniques. The SiO concentration was estimated by comparisons between experimental and computed spectra. These two methods allow us to monitor the time evolution of SiO in the discharge and the post-discharge.


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