Доступ предоставлен для: Guest
Портал Begell Электронная Бибилиотека e-Книги Журналы Справочники и Сборники статей Коллекции
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
Том 23, 2019 Том 22, 2018 Том 21, 2017 Том 20, 2016 Том 19, 2015 Том 18, 2014 Том 17, 2013 Том 16, 2012 Том 15, 2011 Том 14, 2010 Том 13, 2009 Том 12, 2008 Том 11, 2007 Том 10, 2006 Том 9, 2005 Том 8, 2004 Том 7, 2003 Том 6, 2002 Том 5, 2001 Том 4, 2000 Том 3, 1999 Том 2, 1998 Том 1, 1997

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v14.i1-2.120
pages 141-156

KINETIC SIMULATION OF DISCHARGES AND AFTERGLOWS IN MOLECULAR GASES

V. Guerra
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisboa
K. Kutasi
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisboa, Portugal; Research Institute for Solid State Physics and Optics of the Hungarian Academy of Sciences, POB 49, H-1525 Budapest, Hungary
M. Lino da Silva
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisboa
P. A. Sa
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisboa; Dep. de Engenharia Fisica, Faculdade de Engenharia, Universidade do Porto
J. Loureiro
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisboa

Краткое описание

A detailed kinetic model is designed and developed in order to investigate gas discharges in molecular plasmas and their afterglows. The theoretical formulation comprises the description of the electron, vibrational, chemical, ionic and surface kinetics.
The model is applied to study and interpret two rather different phenomena. The first one is the nitrogen pink afterglow. It is established that the maxima present in the concentrations of several species - which appear downstream from the discharge in a flowing nitrogen afterglow, in a field-free region and after a dark zone - are formed as a result of the V-V up-pumping of N2(Χ1Σ+g) molecules, followed by V-E transfers producing locally the metastable states N2(Α3Σ+u) and N2(α,1Σ−u). The need for an accurate description of the high vibrational levels is pointed out. The vibrational energy levels are recalculated from the RKR method and used additionally in the study of dissociation in extreme re-entry conditions.
The second application is the study of a plasma sterilization system using an Ar-O2 mixture. It is shown that the Ar(4s) do not survive long enough to be responsible for the UV/VUV emissions in the reactor, and that O2 is strongly dissociated. Moreover, the choice of the wall material can contribute significantly to create a more homogeneous distribution of several active species.


Articles with similar content:

EXCITED SPECIES AND C-ATOM DENSITY DOWNSTREAM AN Ar PLASMA TORCH WITH OLEFINS (CH4, CF4) IN IMPURITY
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.1, 1997, issue 4
Jacques Amouroux, S. Al Ayoubi, Andre Ricard, S. Cavadias
THEORETICAL INVESTIGATIONS OF HYDROCARBON SPECIES APPEARING IN PLASMA
Progress in Plasma Processing of Materials, 1999, Vol.1, 1999, issue
Jelena Radic-Peric, Miljenko Peric
CATALYCITY AND AGEING STUDY OF SPACE SHUTTLE MATERIAL: REGENERATION OF THEIR ORIGINAL CATALYTIC PROPERTIES
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.13, 2009, issue 3-4
Jacques Amouroux, V. Micheli, S. Cavadias, G. Da Rold, N. Laidani, C. Guyon
TWO DIMENSIONAL HYDRODYNAMIC AND KINETIC DESCRIPTION OF A DIELECTRIC BARRIER DISCHARGE (DBD) IN NITROGEN AT ATMOSPHERIC PRESSURE
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.14, 2010, issue 1-2
F. Clement, N. Spyrou, E. Panousis, J.-F. Loiseau, B. Held, L. Papageorghiou
COMPARATIVE STUDY BETWEEN KINETIC AND THERMODYNAMIC CALCULATION OF COMPOSITION IN SF6 PLASMAS
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.15, 2011, issue 2
A. Lefort, M. F. Elchinger, Jacque Aubreton, Pierre Fauchais, V. Rat, P. Andre