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Портал Begell Электронная Бибилиотека e-Книги Журналы Справочники и Сборники статей Коллекции
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
Том 23, 2019 Том 22, 2018 Том 21, 2017 Том 20, 2016 Том 19, 2015 Том 18, 2014 Том 17, 2013 Том 16, 2012 Том 15, 2011 Том 14, 2010 Том 13, 2009 Том 12, 2008 Том 11, 2007 Том 10, 2006 Том 9, 2005 Том 8, 2004 Том 7, 2003 Том 6, 2002 Том 5, 2001 Том 4, 2000 Том 3, 1999 Том 2, 1998 Том 1, 1997

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v14.i1-2.100
pages 119-127

TRANSITION BETWEEN E-MODE AND H-MODE IN A CYLINDRICAL INDUCTIVELY COUPLED PLASMA REACTOR

F. Croccolo
Dipartimento di Fisica "G. Occhialini", Università degli Studi di Milano- Bicocca, Piazza della Scienza 3,I-20126 Milano
A. Quintini
Dipartimento di Fisica G. Occhialini, Universitá degli Studi di Milano-Bicocca, Piazza della Scienza 3,I-20126 Milano, Italy
R. Barni
Dipartimento di Fisica G. Occhialini, Universitá degli Studi di Milano-Bicocca, Piazza della Scienza 3,I-20126 Milano, Italy
C. Riccardi
Universitá degli Studi di Milano-Bicocca, Dipartimento di Fisica "G.Occhialini", p.za della Scienza, 3 I-20126 Milano ITALY

Краткое описание

An Inductively Coupled Plasma source was previously applied by us to surface treatment of a plastic material in moderate power conditions. In these conditions the coupling between the antenna and the plasma is capacitive and is usually referred to as E-mode. The machine has been modified to operate at working powers up to 1 kW, thus providing a real inductive coupling, referred to as H-mode.
The plasma is generated by applying a 13.56 MHz radio-frequency to a λ/ 4 antenna wrapped outside a quartz tube. The plasma chamber is evacuated by a rotary pump down to about 0.1 Pa and eventually fed with Argon at working pressures in the range from 1 to 100 Pa.
In the present work the transition from capacitive to inductive coupling mode is investigated by means of electrical and optical methods. The two methods are compared and experiments reveal that the transition occurs at decreasing power levels in the range between 100 and 200 W, while pressure is increased from 1 to 100 Pa. The percentage of power that is delivered to the plasma is investigated, too, and appears to be proportional to the input power.


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