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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v14.i3.80
pages 295-303

COMPOSITION OF A THERMAL PLASMA FORMED FROM PTFE WITH COPPER IN NON-OXIDANT ATMOSPHERE, PART II: COMPARISON OF A TEST CASE WITH NITROGEN

P. Andre
Laboratoire Arc Electrique et Plasmas Thermiques CNRS FRE 3120, Phys. Bât. 5 - Université Blaise Pascal, Aubière Cedex, France; and P.R.E.S. Clermont Université, Clermont-Ferrand Cedex 1, France
Z. Koalaga
LAME,Ouagadougou University, 03 BP7021, Ouagadougou, Burkina Faso

RESUMO

The aim of this work is to compare the main characteristic of good dielectric gas defined in our previous paper with nitrogen gas. We study the molar fraction of chemical species in PTFE, N2 and Cumixture for several proportions and pressures. We show that the nitrogen gas does not satisfy the characteristic of good dielectric leading manufacturers tomodify entirely their electrical insulation set up.


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