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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v1.i3.60
pages 347-367

Laser-Plasma Processes in Laser-Technology

Reinhart Poprawe
Chair for Laser Technology, LLT, RWTH Aachen University, Steinbachstr. 15, 52074 Aachen, Germany
Eckhard Beyer
Fraunhofer Institut fur Lasertechnik, Aachen, Germany
Peter Loosen
Fraunhofer Institut fur Lasertechnik, Aachen, Germany
Rolf Wester
Fraunhofer Institut fur Lasertechnik, Aachen, Germany
Rainer Lebert
Lehrstuhl fur Lasertechnik, RWTH Aachen, Germany

RESUMO

Plasmas are indispensable in laser technology. For applications such as media for high power lasers, laser machining, quality monitoring, chemical analysis and high brightness short wavelength sources problems, solutions and results are discussed.
The plasmas involved cover a wide range of densities and temperatures. Light emission ranging from the far infrared to x-rays is used. CW operation on one hand and extremely short pulses on the other hand imply different temporal behaviour. Thus for each single application different physical domains are relevant and different fundamental physical processes dominate the interaction of the laser beam with the plasma.


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