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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

年間 4 号発行

ISSN 印刷: 1093-3611

ISSN オンライン: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

Indexed in

巻 11, 2007 発行 4

DOI: 10.1615/HighTempMatProc.v11.i4

EXPRESS ANALYSIS OF PARAMETERS OF HIGH ENTHALPY PLASMA JETS A. A. Belevtsev, V. F. Chinnov, E. Kh. Isakaev
pp. 477-492
DOI: 10.1615/HighTempMatProc.v11.i4.10
PLASMA PROCESSING OF CONCRETE AND RELATED MATERIALS B. Dzur
pp. 493-503
DOI: 10.1615/HighTempMatProc.v11.i4.20
NEW FEEDING SYSTEM FOR PLASMA REACTOR "PLASMALAB" FOR REDUCTION PROCESSING OF DISPERSE RAW AND WASTE MATERIALS Mihail K. Mihovsky, V. Hadzhiyski, L. Todorov
pp. 505-513
DOI: 10.1615/HighTempMatProc.v11.i4.30
PROPERTIES OF ATMOSPHERIC PRESSURE GLOW DISCHARGE WITH LIQUID ELECTROLYTE CATHODE V. A. Titov, V. V. Rybkin, S. A. Smirnov, A. L. Kulentsan, H.-S. Choi
pp. 515-525
DOI: 10.1615/HighTempMatProc.v11.i4.40
THE INFLUENCE OF SOLUTION COMPONENT TRANSFER TO THE PLASMA ON GAS DISCHARGE PROPERTIES A. I. Maximov, A. V. Khlyustova
pp. 527-535
DOI: 10.1615/HighTempMatProc.v11.i4.50
COMPREHENSIVE MODIFICATION OF SEMICONDUCTORS AND METALS PROVIDING NEW STRUCTURAL FEATURES OF SURFACE LAYERS SUBJECTED TO COMPRESSION PLASMA FLOWS V. M. Astashinski, Siarhei I. Ananin, E. A. Kostyukevich, Anton M. Kuzmitski, Vladimir V. Uglov, V. M. Anishchik, Nikolai N. Cherenda, A. K. Stalmashonak, Yu. V. Sveshnikov, N. T. Kvasov, A. L. Danilyuk, A. V. Punko
pp. 537-548
DOI: 10.1615/HighTempMatProc.v11.i4.60
MODEL OF A PLASMA PHOTOELECTRIC CONVERTER WITH A THIN TRANSITION LAYER BETWEEN ALKALI VAPORS AND BUFFER GAS N. A. Gorbunov, A. N. Kopitov, Gilles Flamant
pp. 549-564
DOI: 10.1615/HighTempMatProc.v11.i4.70
IMPURITY COMPOSITION OF ATOMIC HYDROGEN BEAM FORMED BY A LOW-PRESSURE ARC-DISCHARGE SOURCE WITH SELF-HEATED CATHODE V. A. Kagadei, D. I. Proskurovski, S. V. Romanenko
pp. 565-573
DOI: 10.1615/HighTempMatProc.v11.i4.80
DIFFERENCES BETWEEN AMORPHOUS AND NANOSTRUCTURED SILICON FILMS AND THEIR APPLICATION IN SOLAR CELL L. Raniero, I. Ferreira, E. Fortunato, R. Martins
pp. 575-583
DOI: 10.1615/HighTempMatProc.v11.i4.90
MODELING OF PULSED CAPILLARY DISCHARGE WAVEGUIDES USING A NON-LTE APPROACH B. H. P. Broks, Joost J. A. M. van der Mullen
pp. 585-592
DOI: 10.1615/HighTempMatProc.v11.i4.100
THE MODIFICATION OF PAPER INDUCED BY RADIO FREQUENCY AND MICROWAVE PLASMA TREATMENT V. V. Azharonok, I. I. Filatova, A. P. Dostanko, S. V. Bordusov, Yu. S. Shynkevich
pp. 593-600
DOI: 10.1615/HighTempMatProc.v11.i4.110
PHOTOACOUSTIC DETERMINATION OF THERMAL CONDUCTIVITY OF ALUMINUM NANOPOWDERS Vladimir An, Charles de Izarra
pp. 601-609
DOI: 10.1615/HighTempMatProc.v11.i4.120
THE BURGERS EQUATION AS AN ELECTRODYNAMIC MODEL IN PLASMA PHYSICS Eric Moreau, Olivier Vallee
pp. 611-617
DOI: 10.1615/HighTempMatProc.v11.i4.130
USING INTELLIGENT OPERATION OF A HIGH VOLTAGE CIRCUIT BREAKER TO IMPROVE ITS OPENING AND CLOSING CAPACITY Xiaoning Chen, Patrick Siarry, Zhiying Ma, Yunsheng Zhang
pp. 619-640
DOI: 10.1615/HighTempMatProc.v11.i4.140
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