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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

年間 4 号発行

ISSN 印刷: 1093-3611

ISSN オンライン: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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ELECTROEXPLOSIVE DOPING OF TITANIUM ALLOY BY BORON CARBIDE AND SUBSEQUENT ELECTRON BEAM PROCESSING

巻 18, 発行 4, 2014, pp. 281-290
DOI: 10.1615/HighTempMatProc.2015015698
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要約

VT6 titanium alloy surface modification is carried out by electroexplosive alloying with a plasma formed in explosion of a titanium foil with a weight powder sample of boron carbides with subsequent irradiation by a pulsed electron beam. The formation of an electroexplosive alloying zone of thickness up to 50 µm with a gradient structure, characterized by the decrease in the concentration of carbon and boron with increasing distance to the treatable surface has been revealed. Subsequent electron-beam treatment of the alloying zone leads to smoothing of the alloying area surface and is accompanied by the formation of a multilayer structure at a depth of 30 µm with alternating layers with different degrees of alloying having the structure at the submicro- and nanoscale level.

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