ライブラリ登録: Guest
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

年間 4 号発行

ISSN 印刷: 1093-3611

ISSN オンライン: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

Indexed in

TEMPERATURE DETERMINATION USING MOLECULAR SPECTRA SIMULATION

巻 1, 発行 4, 1997, pp. 493-509
DOI: 10.1615/HighTempMatProc.v1.i4.80
Get accessGet access

要約

Noisy and spectrally not well resolved molecular emission spectra were employed for evaluation of the rotational and vibration temperature in different plasma sources. This diagnostic method may be applied in a large temperature range. It is especially useful when the apparatus function of a recording system is unknown. The described method is based on a comparison of experimental data with a theoretically calculated spectrum. A numerical minimization procedure is started with the temperature value obtained from the Boltzmann plot or intensity ratio of two selected spectrum components. Examples are given with C2(d3Πg,ν'=0) → C2(a3Πu,ν"=0) Swan band at 516.611 nm, OH (А2Σ+,ν’=0)→ OH(X2Πν''=0) band at 306.357 nm, and CH(А2Δ-Х2Π) system around 431.5 nm.

によって引用された
  1. He X. N., Shen X. K., Gebre T., Xie Z. Q., Jiang L., Lu Y. F., Spectroscopic determination of rotational temperature in C_2H_4/C_2H_2/O_2 flames for diamond growth with and without tunable CO_2 laser excitation, Applied Optics, 49, 9, 2010. Crossref

  2. Anghel Sorin D., Simon Alpar, Frentiu Tiberiu, Characterization of a very low power argon CCP, Journal of Analytical Atomic Spectrometry, 20, 9, 2005. Crossref

  3. Lago V., Lebehot A., Dudeck M., Pellerin S., Renault T., Echegut P., Entry Conditions in Planetary Atmospheres: Emission Spectroscopy of Molecular Plasma Arcjets, Journal of Thermophysics and Heat Transfer, 15, 2, 2001. Crossref

  4. Nekahi A., Farzaneh M., Rotational temperature measurement of an arc formed over an ice surface, IEEE Transactions on Dielectrics and Electrical Insulation, 18, 3, 2011. Crossref

  5. de IZARRA C., COMPUTER SIMULATION OF THE UV OH BAND SPECTRUM, International Journal of Modern Physics C, 11, 05, 2000. Crossref

  6. Nekahi A, Farzaneh M, Effect of voltage type and polarity on the gas temperature of an arc over an ice surface, 2011 Electrical Insulation Conference (EIC)., 2011. Crossref

  7. Izarra Charles de, UV OH spectrum used as a molecular pyrometer, Journal of Physics D: Applied Physics, 33, 14, 2000. Crossref

Begell Digital Portal Begellデジタルライブラリー 電子書籍 ジャーナル 参考文献と会報 リサーチ集 価格及び購読のポリシー Begell House 連絡先 Language English 中文 Русский Português German French Spain