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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

年間 4 号発行

ISSN 印刷: 1093-3611

ISSN オンライン: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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INFLUENCE OF HYDROGEN PLASMA TREATMENT ON THE STRUCTURE AND OPTICAL PROPERTIES OF TIN OXIDE THIN FILM PRODUCED BY MAGNETRON SPUTTERING

巻 9, 発行 2, 2005, pp. 307-319
DOI: 10.1615/HighTempMatProc.v9.i2.130
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要約

The influence of glow discharge hydrogen plasma treatment on undoped tin dioxide thin films has been studied. The films with thickness of ∼ 350 nm have been prepared by a method of magnetron sputtering in argon-oxygen atmosphere on glass substrate. Temperature of the substrate was 200 °C. It has been shown that these films were amorphous just after fabrication; their polycrystalline structure was formed during annealing and it was worsened after processing in the hydrogen plasma. The dependences of structural and optical properties of SnOx films from various regimes of treatment by hydrogen plasma and the annealing in air at temperature of 550 °C have been investigated. The values of optical parameters, density and porosity of SnOx films after different regimes of treatment were found. Correlation between the structural and optical properties of tin oxide films is discussed.

によって引用された
  1. Dmitrieva E. A., Mukhamedshina D. M., Beisenkhanov N. B., Mit’ K. A., The effect of NH4F and NH4OH on the structure and physical properties of thin SnO2 films synthesized by the sol-gel method, Glass Physics and Chemistry, 40, 1, 2014. Crossref

  2. Mukhamedshina D.M., Beisenkhanov N.B., Mit' K.A., Valitova I.V., Botvin V.A., Investigation of properties of thin oxide films SnOx annealed in various atmospheres, Thin Solid Films, 495, 1-2, 2006. Crossref

  3. Mukhamedshina D. M., Mit’ K. A., Beisenkhanov N. B., Dmitriyeva E. A., Valitova I. V., Influence of plasma treatments on the microstructure and electrophysical properties of SnO x thin films synthesized by magnetron sputtering and sol–gel technique, Journal of Materials Science: Materials in Electronics, 19, S1, 2008. Crossref

  4. Chen Wei, Ghosh Debraj, Chen Shaowei, Large-scale electrochemical synthesis of SnO2 nanoparticles, Journal of Materials Science, 43, 15, 2008. Crossref

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