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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v9.i3.10
pages 321-344

Numerical modeling for a better understanding of gas discharge plasmas

Annemie Bogaerts
University of Antwerp, Department of Chemistry, PLASMANT Research Group, Universiteitsplein 1, 2610 Antwerp, Belgium
Kathleen De Bleecker
PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Wilrijk-Antwerp, Belgium
Violeta Georgieva
University of Antwerp, Department of Chemistry, Universiteitsplein 1, B-2610 Wilrijk-Antwerp, Belgium
Dieter Herrebout
University of Antwerp, Department of Chemistry, Universiteitsplein 1, B-2610 Wilrijk-Antwerp, Belgium
Ivan Kolev
University of Antwerp, Department of Chemistry, Universiteitsplein 1, B-2610 Wilrijk-Antwerp, Belgium
Myriam Madani
University of Antwerp, Department of Chemistry, Universiteitsplein 1, B-2610 Wilrijk-Antwerp, Belgium
Erik Neyts
University of Antwerp, Department of Chemistry, PLASMANT Research Group, Universiteitsplein 1, 2610 Antwerp, Belgium

要約

We present here some of our modeling efforts for gas discharge plasmas, used in a number of applications in materials science. Different kinds of modeling approaches are applied, including fluid models, particle-in-cell — Monte Carlo (PIC-MC) models and hybrid Monte Carlo — fluid models, for the plasma behavior, as well as molecular dynamics simulations for thin film growth. The application fields include the deposition of amorphous hydrogenated carbon layers (diamond-like carbon) from hydrocarbon plasmas, the dust formation in silane discharges, the surface treatment with dielectric-barrier discharges, magnetron discharges used for sputter-deposition, dual-frequency capacitively coupled radio-frequency (cc-rf) discharges in CF4/Ar/N2, for etching applications, and glow discharges for spectrochemical analysis of materials.