年間 4 号発行
ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360
Indexed in
Numerical modeling for a better understanding of gas discharge plasmas
要約
We present here some of our modeling efforts for gas discharge plasmas, used in a number of applications in materials science. Different kinds of modeling approaches are applied, including fluid models, particle-in-cell Monte Carlo (PIC-MC) models and hybrid Monte Carlo fluid models, for the plasma behavior, as well as molecular dynamics simulations for thin film growth. The application fields include the deposition of amorphous hydrogenated carbon layers (diamond-like carbon) from hydrocarbon plasmas, the dust formation in silane discharges, the surface treatment with dielectric-barrier discharges, magnetron discharges used for sputter-deposition, dual-frequency capacitively coupled radio-frequency (cc-rf) discharges in CF4/Ar/N2, for etching applications, and glow discharges for spectrochemical analysis of materials.
-
Jin Xing, Cheng Xianghui, Duan Faxin, Zhang Jingjing, Study on the Influence of RF Power on Inductively Coupled Plasma Ion Source Injector Gas, 2018 37th Chinese Control Conference (CCC), 2018. Crossref