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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v5.i2.20
9 pages

ON-LINE DIAGNOSTIC OF THE GASEOUS EFFLUENT OF A FLY ASH TREATMENT PLASMA PROCESS: SET-UP OF A CHEMICAL BALANCE

F. Genet
Laboratoire de Genie des Procedes Plasmas et Traitement de Surfaces Universite Pierre et Marie Curie - ENSCP 11 rue Pierre et Marie Curie, 75231 Paris Cedex 05 - France
M. F. Gonnord
Laboratoire des Mecanismes Reactionnels - CNRS UMR 7651, Ecole polytechnique, 91128 Palaiseau Cedex - France
K. Coulibaly
Laboratoire de Genie des Procedes Plasmas et Traitement de Surfaces Universite Pierre et Marie Curie - ENSCP 11 rue Pierre et Marie Curie, 75231 Paris Cedex 05 - France
S. Cavadias
Laboratoire Genie Precedes Plasmas - ENSCP 11, rue Pierre et Marie Curie - 75005 Paris- France
Jacques Amouroux
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

要約

Plasma processes are today considered as one of the most promising techniques for the treatment of industrial or domestic waste incineration for they are fast and cheap in terms of energy consumption. The most important part of this paper relies on the development of a clean-up and GC/MS analysis protocol for fly ash volatile organic compounds identification, and on the monitoring of metallic oxides and chlorides evaporation during the plasma treatment by optical emission spectroscopy. Thermal and chemical balances were evaluated in order to optimize the process, also in regards to environmental regulation constraints.