ホーム > Begell Houseの著者、編集者及びレビュー者
A. S. Drenin
Department of Semiconductor Electronics and Semiconductor Physics, National University of Science and Technology "MISiS" (NUST "MISiS"), Moscow, 119049, Russia
Articles:
HIGH-RATE HIGH-DENSITY ICP ETCHING OF GERMANIUM - Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes