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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Published 4 issues per year

ISSN Print: 1093-3611

ISSN Online: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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ANALYSIS OF UNRESOLVED THERMOMETRIC GROUPS OF ROTATIONAL LINES OF THE OH UV SPECTRUM IN THE WAVELENGTH RANGE 310-318 NM

Volume 9, Issue 4, 2005, pp. 521-530
DOI: 10.1615/HighTempMatProc.v9.i4.30
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ABSTRACT

Previous experimental and theoretical studies [1, 2, 3] of the UV spectrum of the OH radical (band head at 306.357 nm, transition Α2Σ,v=0Χ2Π,v′=0), easily observed in hot gases containing oxygen and hydrogen (flames, plasma chemistry), have showed the existence of three groups of unresolved rotational lines which evolution against the rotational temperature is sensitive and monotonous. From a numerical simulation of the UV OH spectrum obtained with the experimental data of Diecke et Crosswhite [4], the variations of the amplitude of these unresolved groups of lines were calibrated as a function of the temperature and of the optical apparatus function. Since the 3 groups of unresolved rotational lines may be perturbed by atomic lines coming from electrode materials in plasma processes (it is the case for neutral aluminium lines at the wavelength 308.2 nm and 309.2 nm), the previous studies have been extended to other groups of unresolved lines in the wavelength range 310−318 nm. Experiments using an oxyacetylene flame clearly demonstrate that the new groups of unresolved lines give a too high rotational temperature value. This effect can be explained with an analysis of the different rotational components that constitute these unresolved groups of lines.

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