High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
Published 4 issues per year
ISSN Print: 1093-3611
ISSN Online: 1940-4360
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INFLUENCE OF DEPOSITION PARAMETERS ON THE STRUCTURE AND THERMAL STABILITY OF Ti−Al−N COATINGS PRODUCED BY REACTIVE MAGNETRON SPUTTERING
Volume 19,
Issue 2, 2015,
pp. 105-112
DOI: 10.1615/HighTempMatProc.2015015725
ABSTRACT
Ti−Al−N coatings were applied by the reactive magnetron sputtering method at different deposition parameters (substrate temperature, bias voltage, and reactive gas flow). The structure and elemental composition of films were determined by the scanning electron microscopy and energy dispersive X-ray analysis, respectively. The thermal stability of Ti−Al−N coatings was studied by the Raman spectroscopy after annealing in air at various temperatures (550°C, 650°C, and 750°C). It was found that the selection of appropriate deposition parameters allows one to obtain Ti−Al−N coatings with improved thermal stability.
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