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The influence of the dispersion model and electrochemical forces on nanoparticle deposition in a turbulent flow

DOI: 10.1615/ICHMT.2012.ProcSevIntSympTurbHeatTransfPal.1790
pages 1752-1761

A. Mehel
LEMTA – Nancy-University – CNRS, ESSTIN, 2 rue Jean Lamour, 54500 Vandoeuvre-lès-Nancy, France; Thermo-Fluids Laboratory, ESTACA, 34 rue Victor Hugo,92300 Levallois-Perret, France

Sinopsis

Nanoparticle transport can be affected by several processes such as dispersion, deposition and agglomeration which are governed by the Brownian and turbulent diffusion mechanisms. When external electric field is applied, electrochemical forces appear which causes, in several cases, the inherent mechanism to be the dominating one in controlling the deposition of charged nanoparticles. This work aims at simulating and assessing the interactions of such mechanisms in particle deposition through the use of an Eulerian-Lagrangian method where mean flow field properties are calculated using the Reynolds Averaged Navier Stokes (RANS) model and the Lagrangian tracking for the dispersed phase. The particle turbulent dispersion was predicted by means of a user-implemented anisotropic Langevin-type model in which the electrostatic and chemical forces such as Coulomb, image and van der Waals forces are taken into account. The simulation results show the importance of the choice of the turbulent dispersion model to correctly predict deposition rates even in presence of large electric field that make the electrostatic deposition mechanism the predominant one but not completely independent of other mechanisms.

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