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RADIATIVE TRANSFER - IV. Fourth International Symposium on Radiative Transfer
June, 20-25, 2004 , Istambul, Turkey

DOI: 10.1615/ICHMT.2004.RAD-4


ISBN Print: 978-1-56700-207-2

ISSN Online: 2642-5629

ISSN Flash Drive: 2642-5661

SEQUENTIAL NANO-PATTERNING USING ELECTRON AND LASER BEAMS: A NUMERICAL METHODOLOGY

page 12
DOI: 10.1615/ICHMT.2004.RAD-4.310
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SINOPSIS

A methodology is presented for nanometer-size patterning of a workpiece using both an electron-beam and a laser. A Monte Carlo/Ray Tracing technique is used in modeling the electron-beam propagation inside a thin gold film. This approach is identical to that of a typical Monte Carlo simulation in radiative transfer except that proper electron scattering properties are employed. The laser propagation within the one-dimensional, non-scattering film on top of a quartz substrate is modeled using a ray-tracing approach and reflections at the boundaries are accounted for with the Fresnel-expressions. The temperature distribution inside a gold film is then predicted using the Fourier law of heat conduction, after evaluating the accuracy of the model for the range considered. A sequential nano-pattern is created using these coupled numerical simulations.

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