MODEL OF REACTIVE VAPORIZATION APPLIED TO THE REDUCTION OF FERROSILICON

J. M. Badie; Gilles Flamant; B. Granier

doi:10.1615/HighTempMatProc.v1.i4.20

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor en Jefes: Valiantsin M. Astashynski (open in a new tab) Andrey V. Gusarov (open in a new tab)

Editor Asociado: Nikolai N. Cherenda (open in a new tab)

Publicado 4 números por año

ISSN Imprimir: 1093-3611

ISSN En Línea: 1940-4360

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MODEL OF REACTIVE VAPORIZATION APPLIED TO THE REDUCTION OF FERROSILICON

Volumen 1, Edición 4, 1997, pp. 433-439

DOI: 10.1615/HighTempMatProc.v1.i4.20

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J. M. Badie
C. N. R. S., Institut de Science et de Genie des Materiaux et Procedes B. P. 5, Odeillo, F-66125 Font-Romeu Cedex

Gilles Flamant
CNRS PROMES UPR 8521, Tecnosud, Rambla de la Thermodynamique, 66100 Perpignan, France

B. Granier
Institut de science et de Genie des Materiaux et Procedes B.P.5 Odeillo 66125 Font - Romeu, France

SINOPSIS

The reduction of ferrosilicon is examined through a model of reactive vaporization. The model is based on the coupling of interfacial chemical equilibrium and mass transfer into a boundary layer of concentration. The incidence of the reduction on the behavior of the impurities in the ferrosilicon (heavy metals) is approached.

PALABRAS CLAVE: Reduction, Ferrosilicon, Model of vaporization, Heavy-metals.

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