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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Publicado 4 números por año

ISSN Imprimir: 1093-3611

ISSN En Línea: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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INFLUENCE OF PLASMA TREATMENTS ON THE PROPERTIES OF SnOx THIN FILMS

Volumen 10, Edición 4, 2006, pp. 603-616
DOI: 10.1615/HighTempMatProc.v10.i4.110
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SINOPSIS

The influence of treatment by glow discharge hydrogen and oxygen plasma on properties of undoped SnOxthin films has been studied. Films of ∼ 350−400 nm thick have been deposited on a glass substrate by magnetron sputtering in an argon-oxygen atmosphere. The dependences of structural, electrical and optical properties of SnOx films on plasma processing time have been investigated. The results are discussed in terms of SnOx thin films microstructure.

CITADO POR
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