Inicio > Autores, Editores y Críticos de Begell House
Ch. Voulgaris
Plasma Technology Lab, Dept.Chem. Engineering, University of Pates, P.O.Box 1407,26500 Patra, Greece
Articles:
TEOS/O2 GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO2 THIN FILMS - Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes