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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v2.i3.80
pages 391-399

RESIDUAL STRESS IN PVD COATINGS - RELATIONSHIP BETWEEN STRESS AND TEXTURE

O. Piot
Faculte des Sciences de Limoges 123, Avenue Albert Thomas - 87060 LIMOGES Cedex - France
C. Gautier
Faculte des Sciences de Limoges 123, Avenue Albert Thomas - 87060 LIMOGES Cedex - France
J. Machet
LMCTS - ESA 6015 - Groupe PVD - Faculte des Sciences de Limoges 123, Avenue Albert Thomas - 87060 LIMOGES Cedex - France

ABSTRAKT

The main purpose of this work is the study of the relationship between the stress and the texture of films of chromium and chromium nitride deposited by different PVD techniques (Vacuum Evaporation, Ion Plating, Vacuum Arc Evaporation).
The effect of two deposition parameters, the substrate temperature and the substrate bias voltage has been investigated. The residual stress has been measured by the analysis of the stress induced sample bending [1].


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