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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2015015725
pages 105-112

INFLUENCE OF DEPOSITION PARAMETERS ON THE STRUCTURE AND THERMAL STABILITY OF Ti−Al−N COATINGS PRODUCED BY REACTIVE MAGNETRON SPUTTERING

F. F. Komarov
Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus; Institute of Applied Physics Problem, 7 Kurchatov Str., Minsk, 220045, Belarus
Iryna M. Klimovich
Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus
O. V. Korolik
Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus
V. A. Zaikov
Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus
O. R. Lyudchik
Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus

ABSTRAKT

Ti−Al−N coatings were applied by the reactive magnetron sputtering method at different deposition parameters (substrate temperature, bias voltage, and reactive gas flow). The structure and elemental composition of films were determined by the scanning electron microscopy and energy dispersive X-ray analysis, respectively. The thermal stability of Ti−Al−N coatings was studied by the Raman spectroscopy after annealing in air at various temperatures (550°C, 650°C, and 750°C). It was found that the selection of appropriate deposition parameters allows one to obtain Ti−Al−N coatings with improved thermal stability.


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