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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2016015994
pages 179-187

STRUCTURE AND MECHANICAL PROPERTIES OF Nb−Al−N NANOCOMPOSITE FILMS AS A FUNCTION OF THE DEPOSITION PARAMETERS

Volodymyr Ivashchenko
Institute for Problems of Material Science, National Academy of Sciences of Ukraine, 3, Krzhyzhanovsky Str., Kiev, 03680, Ukraine
Vladyslav Rogoz
Sumy State University, 2, Rimsky-Korsakov Str., Sumy, 40000, Ukraine; NanoBioMedical Center, Adam Mickiewicz University in Poznan, 85, Umultowska Str., Poznan, Poland
Pavlo Skrynskiy
Institute for Problems of Material Science, National Academy of Sciences of Ukraine, 3, Krzhyzhanovsky Str., Kiev, 03680, Ukraine
Czeslaw Kozak
Department of Electrical Devices and High Voltage Technology, Lublin University of Technology, 38D, Nadbystrzycka Str., 20-618 Lublin, Poland
Marek Opielak
Institute of Transport, Combustion Engines and Ecology, Lublin University of Technology, 36, Nadbystrzycka Str., 20-618 Lublin, Poland

ABSTRAKT

Nb−Al−N films were deposited by magnetron sputtering of Nb and Al in an atmosphere of Ar−N2 onto silicon wafers, at different currents of magnetron power supply, on which an aluminum (IAl) target is mounted. The films were studied by X-ray diffractometry, nano- and microindentation. The size of nanocrystals, microstrain, nanohardness, and the elastic modulus are extremely dependent on IAl. The films exhibit nanohardness and Knoop hardness in the range 29−33.5 GPa and 46−48 GPa, respectively.


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