Home > Autoren, Herausgeber und Rezensenten von Begell House
S. Rousseau
Laboratoire de Génie des Procédés Plasmas et Traitement de Surface − Université Pierre et Marie Curie − Paris 6 - ENSCP, 11, rue Pierre et Marie Curie, 75231 Paris Cedex 05
Articles:
RF PLASMA PROCESS FOR HIGH PURITY SILICON - Vol. 10 '2006 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF THE DC BIAS APPLIED TO A MG MOLTEN SILICON BATH ON ITS PURIFICATION BY RF THERMAL PLASMA - Vol. 13 '2009 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes