高温材料处理:国际期刊
每年出版 4 期
ISSN 打印: 1093-3611
ISSN 在线: 1940-4360
IF:
0.4
Immediacy Index:
0.1
Eigenfactor:
0.00005
JCI:
0.07
SJR:
0.198
SNIP:
0.48
CiteScore™::
1.1
H-Index:
20
Indexed in
PLASMA-ASSISTED DEPOSITION OF NANOSTRUCTURED FILMS AND COATINGS
卷 15,
册 4, 2011,
pp. 293-298
DOI: 10.1615/HighTempMatProc.v15.i4.50
摘要
Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.
键词: nanoparticles, nanostructured films, hypersonic plasma particle deposition, plasma spraying, dusty plasmas
对本文的引用
-
Kirchschlager F., Wolf S., Greiner F., Groth S., Labdon A., In-situanalysis of optically thick nanoparticle clouds, Applied Physics Letters, 110, 17, 2017. Crossref
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