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高温材料处理:国际期刊
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 打印: 1093-3611
ISSN 在线: 1940-4360

高温材料处理:国际期刊

DOI: 10.1615/HighTempMatProc.v1.i4.60
pages 473-483

THERMAL PLASMA DESTRUCTION OF ORGANOHALOGENATED WASTE

K. Coulibaly
Laboratoire de Genie des Procedes Plasmas et Traitement de Surfaces Universite Pierre et Marie Curie - ENSCP 11 rue Pierre et Marie Curie, 75231 Paris Cedex 05 - France
F. Genet
Laboratoire de Genie des Procedes Plasmas et Traitement de Surfaces Universite Pierre et Marie Curie - ENSCP 11 rue Pierre et Marie Curie, 75231 Paris Cedex 05 - France
M.F. Renou-Gonnord
Laboratoire des Mecanismes Reactionnels - CNRS URA 1307 Ecole Polytechnique - 91128 Palaiseau Cedex - France
Jacques Amouroux
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

ABSTRACT

A thermal plasma reactor was used for the destruction of model halogenated molecules, CF4 and CCl2F2. A multi-approach study was carried out including thermal and kinetic modeling and on-line and off-line chemical diagnostics.
The role of heterogenous phase reactions in trapping halogen moieties was demonstrated by coupling the plasma reactor to a CaO fluidized spouted-bed. The complete process evaluation relies on both thermal and chemical balances and also on the control of toxic emissions through exhaust gases. A procedure for the detection of traces of toxic compounds at the ppb level was thus developed in order to check the compliance of the process to environmental regulations. This work opens the field of plasma depollution to halogenated wastes.