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高温材料处理:国际期刊
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 打印: 1093-3611
ISSN 在线: 1940-4360

高温材料处理:国际期刊

DOI: 10.1615/HighTempMatProc.v2.i1.110
pages 143-154

STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON

I.A. Anisimova
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
V.P. Anisimov
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
V.P. Makarov
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
D.K. Otorbaev
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic

ABSTRACT

Amorphous hydrogenated carbon films were deposited in the plasma of a low-pressure arc discharge burning at the evaporating graphite electrode and in the plasma of a unbalanced magnetron sputtering discharge in different gas environments (Ar, CH4). The film structure was investigated by micro-diffraction method of transmission electron microscopy. Influence of the deposition technique and of the gas composition on the structure and on optical and electrical properties of the deposited films have been investigated.