首页 > Begell House作者,编辑及审稿者
Valentina A. Gorushko
JSC "INTEGRAL" − Holding Management Company, 121A Kazinets Str., Minsk, 220108, Belarus
Articles:
CHARACTERISTIC FEATURES OF HEATING SEMICONDUCTOR SILICON STRUCTURES DURING RAPID THERMAL TREATMENT IN THE VLSI TECHNOLOGY - Vol. 22 '2018 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
FORMATION OF PLATINUM SILICIDE DURING RAPID THERMAL PROCESSING OF THE PLATINUM− SILICON SYSTEM: MICROSTRUCTURE AND ELECTROPHYSICAL CHARACTERISTICS - Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
FORMATION OF PLATINUM SILICIDE LAYERS DURING THE RAPID THERMAL PROCESSING OF THE PLATINUM–SILICON SYSTEM: STRUCTURAL-PHASE CHANGES - Vol. 23 '2019 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes