首页 > Begell House作者,编辑及审稿者
M. Nikravech
Laboratoire de Genie des Precedes Plasmas et Traitement de Surfaces, Universite P. et M. Curie, Ecole Nationale Superieure de Chimie de Paris, 11 rue Pierre et Marie Curie 75005 Paris, France
Articles:
EFFECTS OF PLASMA PARAMETERS ON PASSIVATION OF POLYCRYSTALLINE SILICON IN INDUCTIVE LOW PRESSURE HYDROGEN PLASMA - Vol. 11 '2007 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
EFFECTS OF PLASMA PARAMETERS ON THE PROPERTIES OF La1-xSrxMnO3 THIN LAYERS DEPOSITED IN LOW-PRESSURE RF PLASMA WAVE SHOCK REACTOR - Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN Ar+H2 RF THERMAL PLASMA USED TO THE SILICON POWDER PURIFICATION. EFFECT OF THE EVAPORATION PHENOMENA - Vol. 7 '2003 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
INVESTIGATION ON SUPERSONIC GAS FLOW COUPLED WITH AN INDUCTIVE LOW-PRESSURE PLASMA USED FOR THE SYNTHESIS OF SOFC MATERIAL - Vol. 8 '2004 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
HYDROGENATION AND PURIFICATION OF SILICON BY RF PLASMA - Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
PASSIVATION OF POLYCRYSTALLINE SILICON BY HYDROGEN PLASMA : CHARACTERIZATION BY IMPEDANCE SPECTROSCOPY - Vol. 9 '2005 - High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes